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k. devices designed for ion beam deposition or Actual physical vapor deposition of the multi-layer reflector for “EUV” masks;

“program” specified in ECCN 3D901 is managed for NS and RS explanations to all Locations as specified pursuant for the national security controls and license review coverage established forth in § 742.

technological Note: with the reasons of 3A001.i, a `50 percent-wave voltage' (`Vπ') will be the utilized voltage needed to generate a section improve of one hundred eighty degrees slot gacor while in the wavelength of light propagating through the optical modulator.

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BIS is introducing § 743.7 to set forth provisions for an annual report of any export, reexport, or transfer (in-country) of “know-how” specified in ECCN 3E905 that is not licensed by a person validated license but is approved pursuant the GAAFET General License normally Order No.

2. `focused chuck overlay' would be the alignment precision of a fresh pattern to an existing pattern printed on the wafer by exactly the same lithographic process. `committed chuck overlay' is often called one machine overlay.

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a “technology” for that “growth” or “generation” of things managed by 4A906.b, 4A906.c, or 4D906; and to regulate in 4E906.b “technological know-how” for the “use” of “program” controlled by 4D906.

1. ECCN 3E905 relates to process “know-how” solely for the “growth” or “production” of GAAFET buildings of integrated circuits in a semiconductor wafer production facility. ECCN 3E905 won't, as an example, control an integrated circuit structure including the Bodily format file in “GDSII” structure or EDA resources, or any other know-how employed to generate the Bodily layout file for integrated circuit style and design. two. ECCN 3E905 doesn't utilize to vertical GAAFET architectures, e.g.,

3A001). the next and third digits differentiate particular person entries by figuring out the type of controls related to the goods contained during the entry ( e.g.,

The domestic advancement of quantum data science and technologies (QIST) industry experts, together with in quantum computing, is insufficient to fill America' QIST strategic aims. The us will continue on to rely on overseas expertise to fill vital workforce gaps. at present, Considerably in the QIST talent developed from the U.S. are foreign individuals. international people are topic to visa necessities as administered via the Department of point out.

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